Thanks that all makes good sense. I was curious about "post-pattering mechanisms"? Is this a new area in fab process technology? Might you have some links? Another 15-20 doublings from where we are today is pretty awesome.
Patterning is the use of multiple masks to get fine features smaller than the wavelength of light you're using where in previous larger feature nodes one mask sufficed: https://en.wikipedia.org/wiki/Multiple_patterning
It's very expensive in terms of tooling, since you need a lot more more masks, and production time spend in lithography steps. See this comment in this discussion https://news.ycombinator.com/item?id=19570724 for a bit more.
